Preparation of optical waveguides using ion implantation

Abstract

In order to be able to miniaturize the optical components of opto-electronic devices, new methods had to be developed for their production. However, there are materials whose optical properties would be very favourable, but it is not possible to use them with current methods, because they suffer physical or chemical damage during the process. For such materials, a method based on ion implantation can be a suitable alternative. Irradiation with high-energy ions has been proven to change the optical and structural properties of the material. This makes it possible, for example, to create optical waveguides if a predetermined area of the sample is irradiated. This can be done by drawing the desired geometry with the help of a pre-made special silicone mask, or by using a microbeam, the appropriate shape can be written directly into the sample. In this article, we review the recent results related to these two methods.